post-cmp cleaner
xtrim-sc-bc300
equipment overview
cassette *4 (load，wet)；load port *4 (unload，dry)；brush tank；mega tank；marangoni dryer；index robot *2；process robot *2；efem *1；ipa gas box；external optional cds
comprehensive functions
supports dual-sided brushing, mega cleaning, slow pull-dry, and adjustable-angle steam knife
quick brush replacement
customizable
supports wafer from 6”to 12”
can be customized according to customer needs
precision wafer handling
integrated mapping technology and vertical wafer retrieval from immersion tanks
pr multi-arm handling with zero cross-contamination
precision control
advanced flow field and temperature control design
precise makeup: optional flow meters / metering pumps / weighing tanks / concentration analyzers
accurate dosing: based on time, concentrationor wafer quantity