
supports double-sided brushing and edge brushing, with quick brush replacement.
optional basic configurations: mega-sonic, diw, n₂, etc.
supports interconnection with cmp equipment / offline sink loading.
robot automatic wafer loading and unloading.
supports automatic chemical mixing and liquid supply.
supports 6", 8" and 12-inch wafers.
customized matching is available according to customer requirements.
professional material selection: achieving efficient particle control.
wafers are transported in a closed-environment modular manner between chambers.